Electron beam evaporators (EFM-Series) for ultra-clean thin layer deposition with integrated flux-feedback control.
Designed for ultra clean thin film growth and molecular beam epitaxy. The EFM is suiable for all standard sample plates.
Desinged for ultra clean deposition on substrates with a diameter up to 50 mm.
The Triple EFM features three independent cells for the evaporation of a wide range of materials from wires, rods or crucibles.
Atomic Hydrogen source designed for cleaning and etching of semiconductor surfaces, for surface passivation, for improvement of thin film growth etc.
The EFM 6 evaporator for larger scale samples. With a crucible capacity of up to 10 cm3, the EFM 6 holds ~10 times as much material as the EFM 3.